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    • Home
    • The Technology
      • Polyaldehydes
      • Anion Conducting Polymers
    • Our Products
      • Polyaldehydes
      • Anion Conducting Polymers
    • Our Solutions
      • tSPL Resists
      • Traditional Photoresist
      • Neat Polyaldehyde
      • Membranes
      • Self-Adhesive Ionomer
    • About Us
      • Contact Us
      • The Team
      • Privacy Policy
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  • Home
  • The Technology
    • Polyaldehydes
    • Anion Conducting Polymers
  • Our Products
    • Polyaldehydes
    • Anion Conducting Polymers
  • Our Solutions
    • tSPL Resists
    • Traditional Photoresist
    • Neat Polyaldehyde
    • Membranes
    • Self-Adhesive Ionomer
  • About Us
    • Contact Us
    • The Team
    • Privacy Policy

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NanoFrazor Resists

Available neat and in anisole.

PA25

0.5, 1, 5 g

Our most popular product, most efficient tSPL performance.

PA15

0.5, 1, 5 g

A balance between efficient tSPL patterning and plasma etch resistance.

PHA75

0.5, 1, 5 g

Most resistant to plasma etching.

Neat Polyaldehydes

High volatility

Request a volume

High volatility comonomer to decrease residue

Custom Synthesis

Request a volume

Have an idea where a functionalized polyaldehyde will work for you? Contact us below!

Request a Quote

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