Signed in as:
filler@godaddy.com
tSPL Resist Solutions for Heidelberg's NanoFrazor
Long-term Shelf Stability
The polymer powder is stable for years at room temperature, improved by storing under cold conditions. Solutions are stable for months under modest conditions.
Efficient tSPL Patterning
Our polyaldehyde copolymers have higher volatility products than typical PPA, meaning it's less likely to form char on your probe-tips.
Laser Sensitive Additives
Grayscale 3D writing using the NanoFrazor laser to quickly etch away large areas that do not require tSPL precision.
Different Solutions for Different Problems
Different copolymer compositions tackle different problems. Higher propanal content increases write efficiency. Higher phthalaldehyde content increases plasma etch and developer resistance.
We have three standard compositions, PH75 (homopolymer), PA15 (15 mol% propanal), and PA25 (25 mol% propanal) to balance the right solution for you.